SPIE Photomask Technology + Extreme Ultraviolet Lithography Experience
Between September 29 and October 3, 2024, SPIE UFSC member Tiago Junior de Bortoli participated in the SPIE Photomask Technology + Extreme Ultraviolet Lithography conference in Monterey, California. The meeting was attended by several companies in the sector and provided an exceptional opportunity for the participants to exchange knowledge.
As part of the conference, our group member had the opportunity to participate in a Special Event Student-Mentor Luncheon. The event provided direct exchanges with SPIE members who have successful careers in the field. The exchange of knowledge was precious and provided great career ideas.
In addition, our member received financial assistance from SPIE to participate in the event, which allowed him to participate for more days and to make the most of the experience.
